Our flux modeling software is designed for showerhead type nozzles for gas injection (CBr4, NH3, etc…). It can also be used to model the uniformity of flux across the wafer from an effusion cell if the cell angular distribution is known. Parameters such as source to substrate distance, incident angle, and wafer/platen size, may be easily changed within a graphical user interface.
A demo version is available for download here: FluxCalc Installer.zip (30,521 KB)
The demo version does not allow the user to change the incident angle. It is fixed at 18 degrees.
An explanation of the user interface is available here (powerpoint):
FluxCalc ReadMe.ppt (783 KB)